About AMC for Cleanrooms
2026-03-05
The characteristics of semiconductors necessitate compliance with cleanliness requirements during their production process:
Impurities can change or disrupt the performance characteristics of semiconductors, so all factors must be strictly controlled during the manufacturing process of semiconductor devices. There are different types of impurities: for example, metal ions can disrupt the electrical conductivity of semiconductor devices, and dust particles can damage their surface structure.
The manufacturing environment requirements for semiconductor devices are very stringent: constant temperature and humidity are required, and cleanliness classes are determined by the number of dust particles of a certain size per unit volume. They are usually divided into classes of 10, 100, 1000, 10,000 and 100,000.
The degree of purity is determined by the maximum allowable number of particles per cubic meter (or cubic foot) of air. The class names correspond to the logarithmic value (base 10) of the maximum permissible number of particles of 0.5 microns or larger in size per cubic meter of air (Imperial cubic foot of air).
What is AMC in Cleanrooms?
AMC (Airborne Molecular Contamination) in cleanrooms are molecular-level contaminants found in the air of cleanrooms. Traditional cleanroom testing primarily focuses on particle control, but in some special cases, molecular-level contaminants can also have a negative impact on the product or process.
Common AMC sources:
1. Chemicals used in the production process
2.Organic sulfides released when using sulfur-containing organic solvents at neighboring enterprises
3.Volatile organic compounds (VOC) released during petrochemical processes and the products of their photochemical reactions
4. Sulfur oxides and nitrogen oxides in the atmosphere
